论文标题

MOS2电容的负压负压

Negative compressibility in MoS2 capacitance

论文作者

Gao, Ruiyan, Ying, Zhehan, An, Liheng, Wu, Zefei, Cai, Xiangbing, Wang, Shi, Ye, Ziqing, Feng, Xuemeng, Huang, Meizheng, Wang, Ning

论文摘要

大电容增强功能可用于增加场效应晶体管(FET)的栅极电容,从而生产具有改善栅极可控性的低能消耗设备。我们报告了新出现的二维通道材料二硫化物(MOS2)中强大的电容增强效应。增强效应是由于MOS2中低载体密度状态下强的电子电子相互作用引起的。我们在单层设备中实现了约50%的电容增强,并且在双层设备中实现了10%的电容增强。但是,增强效果在多层设备(层编号> 3)中并不明显。使用Hartree-fock近似,我们说明了反向压缩性数据中相同的趋势。

Large capacitance enhancement is useful for increasing the gate capacitance of field-effect transistors (FETs) to produce low-energy-consuming devices with improved gate controllability. We report strong capacitance enhancement effects in a newly emerged two-dimensional channel material, molybdenum disulfide (MoS2). The enhancement effects are due to strong electron-electron interaction at the low carrier density regime in MoS2. We achieve about 50% capacitance enhancement in monolayer devices and 10% capacitance enhancement in bilayer devices. However, the enhancement effect is not obvious in multilayer (layer number >3) devices. Using the Hartree-Fock approximation, we illustrate the same trend in our inverse compressibility data.

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